Electronic mixed gases are widely used in large-scale integrated circuits (L.S.I), ultra large scale integrated circuits (V.L.S.I), and semiconductor device production. They are mainly used in gas phase epitaxy (production), chemical vapor deposition, doping (impurity diffusion), various etching and ion implantation processes.
No Electronic Mixed Gas Summary
1. Dichlorosilane (DCS) 5000ppm+N2; Dichlorosilane (DCS) 15ppm+N2
2 dichlorosilane (DCS) 10ppm+trichlorosilane (TCS) 10ppm+helium
3 HCI 50ppm+dichlorosilane (DCS) 1000ppm+equilibrium He
4 Silane 1%+Dichlorosilane (DCS) 1%+Trichlorosilane (TCS) 1%+Tetrachlorosilane 1%+Nitrogen
5 Silane 50ppm+Trichlorosilane (TCS) 1000ppm+He
6 Trichlorosilane (TCS) 15ppm+N2
7 Ethylsilane (Si2H4) 100ppm~200ppm+H2
8 Ethylsilane 10ppm+He
9 CO2 5ppm+silane 135ppm+ethylsilane 1000ppm+He
10 SiH4 5ppm~15%+Ar (H2/N2/He)
11 H2 5ppm+Ar 5ppm+N2 5ppm+CO 5ppm+CH4 5ppm+Equilibrium He of CO2 5ppm+silane 1000ppm
12 Ethylborane 50-100ppm+H2
13 Arsenane 100ppm~0.7%+H2
14 germanane 1%~10%+H2
15 Boron trichloride 1%~5%+N2 (He)
16 PH3 0.8ppm~500ppm+He (H2)
17 HCI 9ppm~50%+N2
18 NF3 99.99% 180g~1500g
19 NF3 20ppm~30ppm+Air
20 NF3 15ppm+N2
21 CF4 80%+O2
22 Ar 5ppm~80%+Ne (H2/He/N2)
23 Kr 8%~50%+Ar
24 Ne 80%~97%+Ar
